Issued Patents 2020
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10566441 | Methods of forming integrated circuits with solutions to interlayer dielectric void formation between gate structures | Hao Nong, Liang Li, Chiew Wah Yap, Yung Fu Chong, Yun Ling Tan | 2020-02-18 |