HW

Holger Walter

CG Carl Zeiss Smt Gmbh: 2 patents #22 of 200Top 15%
AB Asml Netherlands B.V.: 1 patents #317 of 801Top 40%
Overall (2020): #167,075 of 565,922Top 30%
2
Patents 2020

Issued Patents 2020

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10859815 Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective 2020-12-08
10684551 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2020-06-16