Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10831114 | Lithography apparatus and method | Björn Liebaug, Jurgen Hofmann, Dietmar Dürr | 2020-11-10 |
| 10684551 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2020-06-16 |