Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10871716 | Metrology robustness based on through-wavelength similarity | Christian Marinus Leewis, Frank Staals | 2020-12-22 |
| 10571812 | Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing method | Fahong Li, Carlo Cornelis Maria Luijten, Bart Peter Bert Segers, Cornelis Andreas Franciscus Johannes Van Der Poel, Frank Staals +2 more | 2020-02-25 |