Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10831101 | Photosensitive resin composition, method for manufacturing cured relief pattern, and semiconductor apparatus | Taihei INOUE, Yoshito IDO, Mitsutaka Nakamura, Tomoshige YUNOKUCHI, Daisuke SASANO +1 more | 2020-11-10 |
| 10719016 | Photosensitive resin composition, polyimide production method, and semiconductor device | Yoshito IDO, Taihei INOUE, Harumi Matsuda | 2020-07-21 |