Issued Patents 2019
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10504990 | Isolation features and methods of fabricating the same | I-Wen Wu, Fu-Kai Yang, Mei-Yun Wang, Jr-Hung Li, Bo-Cyuan Lu | 2019-12-10 |
| 10490459 | Method for source/drain contact formation in semiconductor devices | Shao-Ming Koh, I-Wen Wu, Fu-Kai Yang, Jia-Heng Wang, Mei-Yun Wang | 2019-11-26 |
| 10475788 | Fin field effect transistor (FinFET) device structure with capping layer and method for forming the same | Chun-Han Chen, Fu-Kai Yang, Mei-Yun Wang, Jr-Hung Li, Bo-Cyuan Lu | 2019-11-12 |
| 10177038 | Prevention of contact bottom void in semiconductor fabrication | Yun Lee, Chung-Ting Ko, Mei-Yun Wang, Fu-Kai Yang | 2019-01-08 |