Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10347499 | Method for etching layer to be etched | Akira Koshiishi, Toshio Haga, Masato Horiguchi, Makoto Kato | 2019-07-09 |
| 10207390 | Processing end point detection method, polishing method, and polishing apparatus | Noburu Shimizu, Shinro Ohta, Yoichi Kobayashi, Ryuichiro Mitani, Shunsuke Nakai +1 more | 2019-02-19 |