Issued Patents 2019
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10483082 | Evaluation method, correction method, recording medium and electron beam lithography system | — | 2019-11-19 |
| 10468232 | Charged particle beam writing apparatus and charged particle beam writing method | Satoru Hirose, Ryosuke Ueba | 2019-11-05 |
| 10345724 | Position correction method of stage mechanism and charged particle beam lithography apparatus | Hidekazu Takekoshi | 2019-07-09 |
| 10283314 | Charged particle beam writing apparatus, and charged particle beam writing method | — | 2019-05-07 |