Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10366887 | Method of using chemically patterned guide layers in chemoepitaxy directing of block co-polymers | Jinhua Dai | 2019-07-30 |
| 10331032 | Photosensitive, developer-soluble bottom anti-reflective coating material | Jinhua Dai, Alice Guerrero | 2019-06-25 |