Issued Patents 2019
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10295916 | EUV source chamber and gas flow regime for lithographic apparatus, multi-layer mirror and lithographic apparatus | Heine Melle Mulder, Andrey Sergeevich TYCHKOV | 2019-05-21 |