Issued Patents 2019
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10400328 | Physical vapor deposition system with a source of isotropic ion velocity distribution at the wafer surface | Daniel J. Hoffman, Karl M. Brown, Ying Rui | 2019-09-03 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10400328 | Physical vapor deposition system with a source of isotropic ion velocity distribution at the wafer surface | Daniel J. Hoffman, Karl M. Brown, Ying Rui | 2019-09-03 |