Issued Patents 2018
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10055531 | Layout checking method for advanced double patterning photolithography with multiple spacing criteria | Chung-Hsing Wang, Yuan-Te Hou, Chin-Chang Hsu, Meng-Kai Hsu | 2018-08-21 |