Issued Patents 2018
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10121811 | Method of high-aspect ratio pattern formation with submicron pixel pitch | Wei-Chao Chiu, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai-Meng Tzeng | 2018-11-06 |
| 10090357 | Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces | Wei-Chao Chiu, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai-Meng Tzeng | 2018-10-02 |
| 9875892 | Method of forming a photoresist layer | Chun-Wei Chang, Wang-Pen Mo, Hung-Chang Hsieh | 2018-01-23 |