EA

Emad Aqad

RM Rohm And Haas Electronic Materials: 4 patents #7 of 131Top 6%
RK Rohm And Haas Electronic Materials Korea: 1 patents #10 of 39Top 30%
📍 Northborough, MA: #8 of 76 inventorsTop 15%
🗺 Massachusetts: #807 of 12,682 inventorsTop 7%
Overall (2018): #46,127 of 503,207Top 10%
4
Patents 2018

Issued Patents 2018

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
10095109 Acid-cleavable monomer and polymers including the same James W. Thackeray 2018-10-09
10088749 Photoacid-generating compound and associated polymer, photoresist composition, and method of forming a photoresist relief image 2018-10-02
9921475 Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image William Williams, III, Cong Liu 2018-03-20
9880469 Resins for underlayers Mingqi Li, Shintaro Yamada, Sung Wook Cho 2018-01-30