FY

Fengji Yeh

Dow Global Technologies: 2 patents #145 of 857Top 20%
RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #12 of 43Top 30%
📍 Wilmington, DE: #31 of 214 inventorsTop 15%
🗺 Delaware: #86 of 598 inventorsTop 15%
Overall (2018): #150,101 of 503,207Top 30%
2
Patents 2018

Issued Patents 2018

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10144115 Method of making polishing layer for chemical mechanical polishing pad David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Yuhua Tong +5 more 2018-12-04
10105825 Method of making polishing layer for chemical mechanical polishing pad David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Yuhua Tong +5 more 2018-10-23