HM

Hidehiro Mochizuki

FU Fujifilm: 2 patents #161 of 822Top 20%
Overall (2018): #144,400 of 503,207Top 30%
2
Patents 2018

Issued Patents 2018

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10120281 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device Koutarou Takahashi, Tomotaka Tsuchimura, Shuhei Yamaguchi, Natsumi Yokokawa 2018-11-06
10011576 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound Shuhei Yamaguchi, Koutarou Takahashi, Tomotaka Tsuchimura, Natsumi Yokokawa 2018-07-03