Issued Patents 2018
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10139727 | Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device | Koutarou Takahashi | 2018-11-27 |
| 10120281 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | Koutarou Takahashi, Shuhei Yamaguchi, Natsumi Yokokawa, Hidehiro Mochizuki | 2018-11-06 |
| 10011576 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound | Shuhei Yamaguchi, Koutarou Takahashi, Natsumi Yokokawa, Hidehiro Mochizuki | 2018-07-03 |
| 10007180 | Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film | Tadateru Yatsuo | 2018-06-26 |
| 9958775 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask | Takuya TSURUTA, Tadeteru Yatsuo | 2018-05-01 |
| 9904167 | Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | — | 2018-02-27 |