Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10048586 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Mitsuo Sato, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori +3 more | 2018-08-14 |