Issued Patents 2018
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10062764 | Semiconductor device having void between gate electrode and sidewall spacer and manufacturing method thereof | Yen-Liang Wu, Wen-Tsung Chang, Jui-Ming Yang, I-Fan Chang, Chih-Wei Lin +2 more | 2018-08-28 |