Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10012898 | EUV mask for monitoring focus in EUV lithography | Martin Burkhardt | 2018-07-03 |
| 9997348 | Wafer stress control and topography compensation | Oleg Gluschenkov, Donghun Kang, Byeong Y. Kim | 2018-06-12 |
| 9921466 | Method for monitoring focus in EUV lithography | Martin Burkhardt | 2018-03-20 |
| 9899183 | Structure and method to measure focus-dependent pattern shift in integrated circuit imaging | Lei Zhuang | 2018-02-20 |