Issued Patents 2018
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10134588 | Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography | Weijun Liu, James DeYoung, Niyaz Khusnatdinov | 2018-11-20 |
| 10095106 | Removing substrate pretreatment compositions in nanoimprint lithography | Weijun Liu, Niyaz Khusnatdinov, Zhengmao Ye, Toshiki Ito | 2018-10-09 |