Issued Patents 2017
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9766541 | Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound | Yoshitaka Komuro, Masatoshi Arai, Daisuke Kawana, Kenta Suzuki, Tatsuya Fujii | 2017-09-19 |