Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9818610 | Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP) | Andrew Metz, Yannick Feurprier, Katie Lutker-Lee | 2017-11-14 |
| 9607834 | Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP) | Andrew Metz, Yannick Feurprier, Katie Lutker-Lee | 2017-03-28 |