Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9659141 | EDA tool and method for conflict detection during multi-patterning lithography | Yen-Hung Lin, Chin-Chang Hsu, Hung-Lung Lin | 2017-05-23 |
| 9563731 | Cell boundaries for self aligned multiple patterning abutments | Chin-Hsiung Hsu, Li-Chun Tien, Pin-Dai Sue, Ching-Hsiang Chang, Wen-Hao Chen | 2017-02-07 |