CY

Chunyan Yi

SC Shanghai Ic R&D Center Co.: 1 patents #1 of 10Top 10%
Overall (2017): #457,314 of 506,227Top 95%
1
Patents 2017

Issued Patents 2017

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
9536987 Line-end cutting method for fin structures of FinFETs formed by double patterning technology Ming-Yang Li 2017-01-03