Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9606452 | Lithography metrology method for determining best focus and best dose and lithography monitoring method using the same | Byung Je Jung, Byoung Il Choi | 2017-03-28 |
| 9570364 | Method of detecting focus shift in lithography process, method of analyzing error of transferred pattern using the same and method of manufacturing semiconductor device using the methods | Suk-Joo Lee, Byoung Il Choi | 2017-02-14 |