Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9822330 | Light-degradable material, substrate, and method for patterning the substrate | Takahiro Kishioka, Shigeo Kimura, Yoshiomi Hiroi, Hiromi Kitano, Tadashi Nakaji +1 more | 2017-11-21 |
| 9793131 | Pattern forming method using resist underlayer film | Tomoya Ohashi, Shigeo Kimura, Hiroto OGATA | 2017-10-17 |
| 9678427 | Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain | Hiroto OGATA, Takahiro Kishioka, Yoshiomi Hiroi, Tomoya Ohashi | 2017-06-13 |