Issued Patents 2017
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9725621 | Chemical mechanical planarization slurry composition comprising composite particles, process for removing material using said composition, CMP polishing pad and process for preparing said composition | Qingling Zhang, Bennett Greenwood, Ravi Sharma, Geoffrey D. Moeser, Mark J. Hampden-Smith | 2017-08-08 |