Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9725621 | Chemical mechanical planarization slurry composition comprising composite particles, process for removing material using said composition, CMP polishing pad and process for preparing said composition | Qingling Zhang, Bennett Greenwood, Ravi Sharma, Geoffrey D. Moeser, Brian G. Prevo | 2017-08-08 |
| 9533523 | Reflective features with co-planar elements and processes for making them | Richard Einhorn, Miodrag Oljaca, Jainisha Shah | 2017-01-03 |