CL

Chung-Hsin Lin

NT Nanya Technology: 1 patents #2 of 21Top 10%
📍 New Taipei, TW: #700 of 2,136 inventorsTop 35%
Overall (2017): #462,393 of 506,227Top 95%
1
Patents 2017

Issued Patents 2017

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
9659886 Method of fabricating semiconductor device having voids between top metal layers of metal interconnects Ping-Heng Wu, Chao-Wen Lay, Hung-Mo Wu, Ying-Cheng Chuang 2017-05-23