NU

Naoya Uchiyama

MC Mitsubishi Gas Chemical Company: 2 patents #31 of 140Top 25%
Overall (2017): #119,908 of 506,227Top 25%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9828355 Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method Masatoshi Echigo, Takashi MAKINOSHIMA 2017-11-28
9809601 Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method Masatoshi Echigo, Takashi MAKINOSHIMA 2017-11-07