Issued Patents 2017
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9828355 | Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Takashi MAKINOSHIMA, Naoya Uchiyama | 2017-11-28 |
| 9809601 | Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Takashi MAKINOSHIMA, Naoya Uchiyama | 2017-11-07 |
| 9785048 | Resist composition | Masaaki Takasuka, Yu Okada, Yumi Ochiai | 2017-10-10 |
| 9598392 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | Masako Yamakawa | 2017-03-21 |
| 9540339 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | Masako Yamakawa | 2017-01-10 |