Issued Patents 2017
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9550322 | Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method | Naomi Shida, Kenji Todori, Shigehiko Mori, Ko Yamada, Reiko Yoshimura +4 more | 2017-01-24 |