Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9741581 | Using tensile mask to minimize buckling in substrate | Sunit S. Mahajan, Parul Dhagat, Anne C. Friedman, Shahrukh Khan | 2017-08-22 |
| 9588440 | Method for monitoring focus in EUV lithography | Martin Burkhardt | 2017-03-07 |