Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9660057 | Method of forming a reduced resistance fin structure | Qing Liu, Ruilong Xie, Chun-Chen Yeh, Xiuyu Cai | 2017-05-23 |
| 9653579 | Method for making semiconductor device with filled gate line end recesses | Qing Liu, Ruilong Xie, Xiuyu Cai, Chun-Chen Yeh | 2017-05-16 |
| 9620505 | Semiconductor device with different fin sets | Qing Liu, Xiuyu Cai, Ruilong Xie, Chun-Chen Yeh, Daniel Chanemougame | 2017-04-11 |