Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9665014 | Charged particle lithography system with alignment sensor and beam measurement sensor | Paul IJmert Scheffers, Jan Andries Meijer, Vincent Sylvester Kuiper, Niels Vergeer | 2017-05-30 |
| 9575418 | Apparatus for transferring a substrate in a lithography system | Vincent Sylvester Kuiper, Marcel Nicolaas Jacobus van Kervinck, Guido De Boer, Hendrik Jan De Jong | 2017-02-21 |