Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9841690 | Method and apparatus for exposure pattern correction and exposure system | Yifeng Li, Hequn Zhang, Xiangming Meng | 2017-12-12 |
| 9719723 | Substrate support structure, vacuum drying apparatus and method for vacuum drying a substrate | Huihui Mu, Min Yuan, Hequn Zhang, Longgen Yang | 2017-08-01 |