Issued Patents 2017
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9844124 | Method, apparatus and system for using free-electron laser compatible EUV beam for semiconductor wafer metrology | Pawitter Mangat | 2017-12-12 |
| 9754829 | Self-aligned conductive polymer pattern placement error compensation layer | Deniz E. Civay | 2017-09-05 |
| 9748176 | Pattern placement error compensation layer in via opening | Deniz E. Civay | 2017-08-29 |
| 9704807 | Pattern placement error compensation layer | Deniz E. Civay | 2017-07-11 |
| 9633942 | Conductively doped polymer pattern placement error compensation layer | Deniz E. Civay | 2017-04-25 |
| 9541839 | Method and device for splitting a high-power light beam to provide simultaneous sub-beams to photolithography scanners | — | 2017-01-10 |