HK

Hiromi Kanda

FU Fujifilm: 2 patents #184 of 785Top 25%
📍 Nanbu, JP: #27 of 131 inventorsTop 25%
Overall (2017): #148,323 of 506,227Top 30%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9709891 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition Shinichi Kanna 2017-07-18
9541831 Positive resist composition and method of pattern formation with the same Shinichi Kanna, Haruki Inabe 2017-01-10