Issued Patents 2017
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9666676 | Method for manufacturing a semiconductor device by exposing, to a hydrogen plasma atmosphere, a semiconductor substrate | — | 2017-05-30 |
| 9659774 | Impurity introducing method, impurity introducing apparatus, and method of manufacturing semiconductor element | Haruo Nakazawa, Kenichi Iguchi | 2017-05-23 |
| 9564334 | Method of manufacturing a semiconductor device | Kenichi Iguchi, Haruo Nakazawa, Tsunehiro Nakajima, Masaaki Tachioka | 2017-02-07 |
| 9548205 | Method of manufacturing a semiconductor device | Haruo Nakazawa, Tsunehiro Nakajima, Kenichi Iguchi, Masaaki Tachioka | 2017-01-17 |