Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9443731 | Material processing to achieve sub-10nm patterning | David L. O'Meara, Akiteru Ko, Kiyohito Ito | 2016-09-13 |
| 9257280 | Mitigation of asymmetrical profile in self aligned patterning etch | Akiteru Ko, Kiyohito Ito | 2016-02-09 |