| 9496262 |
High mobility transistors |
Manoj Mehrotra, Charles Frank Machala, III, Rick L. Wise |
2016-11-15 |
| 9484255 |
Hybrid source and drain contact formation using metal liner and metal insulator semiconductor contacts |
Shariq Siddiqui, Tenko Yamashita |
2016-11-01 |
| 9431509 |
High-K metal gate |
James Joseph Chambers |
2016-08-30 |
| 9412695 |
Interconnect structures and methods of fabrication |
Ruilong Xie, Andreas Knorr |
2016-08-09 |
| 9396951 |
System and method for mitigating oxide growth in a gate dielectric |
Malcolm J. Bevan, Haowen Bu, Husam N. Alshareef |
2016-07-19 |
| 9397003 |
Method for forming source/drain contacts during CMOS integration using confined epitaxial growth techniques |
Ruilong Xie |
2016-07-19 |
| 9397009 |
Structure and method for metal gate stack oxygen concentration control using an oxygen diffusion barrier layer and a sacrificial oxygen gettering layer |
James Joseph Chambers |
2016-07-19 |
| 9397100 |
Hybrid high-k first and high-k last replacement gate process |
Manoj Mehrotra, Mahalingam Nandakumar |
2016-07-19 |
| 9368355 |
System and method for mitigating oxide growth in a gate dielectric |
Malcolm J. Bevan, Haowen Bu, Husam N. Alshareef |
2016-06-14 |
| 9356131 |
Metal-gate MOS transistor and method of forming the transistor with reduced gate-to-source and gate-to-drain overlap capacitance |
Manoj Mehrotra |
2016-05-31 |
| 9337046 |
System and method for mitigating oxide growth in a gate dielectric |
Malcolm J. Bevan, Haowen Bu, Husam N. Alshareef |
2016-05-10 |
| 9337297 |
Fringe capacitance reduction for replacement gate CMOS |
Mahalingam Nandakumar |
2016-05-10 |
| 9337044 |
System and method for mitigating oxide growth in a gate dielectric |
Malcolm J. Bevan, Haowen Bu, Husam N. Alshareef |
2016-05-10 |
| 9324717 |
High mobility transistors |
Manoj Mehrotra, Rick L. Wise |
2016-04-26 |
| 9269636 |
High quality dielectric for hi-k last replacement gate transistors |
Mahalingam Nandakumar |
2016-02-23 |
