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Stress relieving semiconductor layer |
Maxim S. Shatalov, Jinwei Yang, Wenhong Sun, Michael Shur, Remigijus Gaska |
2016-11-22 |
| 9406840 |
Semiconductor layer including compositional inhomogeneities |
Michael Shur, Maxim S. Shatalov, Alexander Dobrinsky, Jinwei Yang, Remigijus Gaska +1 more |
2016-08-02 |
| 9397260 |
Patterned layer design for group III nitride layer growth |
Wenhong Sun, Jinwei Yang, Maxim S. Shatalov, Alexander Dobrinsky, Michael Shur +1 more |
2016-07-19 |
| 9331244 |
Semiconductor structure with inhomogeneous regions |
Maxim S. Shatalov, Alexander Dobrinsky, Alexander Lunev, Jinwei Yang, Michael Shur +1 more |
2016-05-03 |
| 9330906 |
Stress relieving semiconductor layer |
Maxim S. Shatalov, Jinwei Yang, Wenhong Sun, Michael Shur, Remigijus Gaska |
2016-05-03 |
| 9324560 |
Patterned substrate design for layer growth |
Maxim S. Shatalov, Jinwei Yang, Michael Shur, Remigijus Gaska |
2016-04-26 |
| 9281441 |
Semiconductor layer including compositional inhomogeneities |
Michael Shur, Maxim S. Shatalov, Alexander Dobrinsky, Jinwei Yang, Remigijus Gaska |
2016-03-08 |