Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9529253 | Predicting pattern critical dimensions in a lithographic exposure process | Jacek Tyminski | 2016-12-27 |
| 9286416 | Scanner based optical proximity correction system and method of use | Jacek Tyminski, Tomoyuki Matsuyama | 2016-03-15 |