Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9458415 | Post chemical-mechanical-polishing (post-CMP) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid | Yuzhuo Li, Shyam Sundar Venkataraman | 2016-10-04 |
| 9275851 | Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices | Andreas Klipp, Vijay Immanuel Raman, Shyam Sundar Venkataraman, Raimund Mellies | 2016-03-01 |