Issued Patents 2016
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9524874 | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films | Eason Yu-Shen Su, Arend Jouke Kingma, Bastian Marten Noller | 2016-12-20 |
| 9487675 | Chemical mechanical polishing composition comprising polyvinyl phosphonic acid and its derivatives | Vijay Immanuel Raman, Yuzhuo Li, Christian Schade, Eason Yu-Shen Su, Sheik Ansar Usman Ibrahim | 2016-11-08 |
| 9458415 | Post chemical-mechanical-polishing (post-CMP) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid | Yuzhuo Li, Mingjie Zhong | 2016-10-04 |
| 9275851 | Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices | Andreas Klipp, Vijay Immanuel Raman, Raimund Mellies, Mingjie Zhong | 2016-03-01 |
| 9255214 | Chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particles | Michael Lauter, Vijay Immanuel Raman, Yuzhuo Li, Daniel Kwo-Hung Shen | 2016-02-09 |