Issued Patents 2016
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9524874 | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films | Shyam Sundar Venkataraman, Eason Yu-Shen Su, Arend Jouke Kingma | 2016-12-20 |
| 9443739 | Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si1-xGex material in the presence of a CMP composition comprising a specific organic compound | Bettina Drescher, Christophe Gillot, Yuzhuo Li | 2016-09-13 |
| 9416298 | Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (CMP) of III-V material in the presence of a CMP composition comprising a specific non-ionic surfactant | Yuzhuo Li, Christophe Gillot, Diana Franz | 2016-08-16 |
| 9263296 | Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors | Michael Lauter, Albert Budiman Sugiharto, Yuzhuo Li, Kenneth Rushing, Diana Franz +1 more | 2016-02-16 |