Issued Patents 2016
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9519745 | Method and apparatus for assisted metal routing | Irene Y. Lin, Jongwook Kye, Mahbub Rashed | 2016-12-13 |
| 9472464 | Methods to utilize merged spacers for use in fin generation in tapered IC devices | Jia Zeng, Youngtag Woo, Yan Wang, Jongwook Kye | 2016-10-18 |
| 9472455 | Methods of cross-coupling line segments on a wafer | Jason E. Stephens, Lixia Lei, David Pritchard, Tuhin Guha Neogi | 2016-10-18 |
| 9436119 | Image forming apparatus having a removable unit with a driving portion | Kazuaki Iikura, Kaoru Watanabe, Kazuhiro Saito, Satoshi Miyawaki, Atsuna Saiki | 2016-09-06 |
| 9437481 | Self-aligned double patterning process for two dimensional patterns | Jia Zeng, Youngtag Woo, Jongwook Kye | 2016-09-06 |
| 9429897 | Image forming apparatus | Kazuaki Iikura, Kaoru Watanabe, Kazuhiro Saito | 2016-08-30 |
| 9400863 | Color-insensitive rules for routing structures | Soo Han Choi, Li Yang, Jongwook Kye | 2016-07-26 |
| 9330221 | Mask-aware routing and resulting device | Jongwook Kye, Harry J. Levinson | 2016-05-03 |
| 9324722 | Utilization of block-mask and cut-mask for forming metal routing in an IC device | Youngtag Woo, Jongwook Kye | 2016-04-26 |
| 9292647 | Method and apparatus for modified cell architecture and the resulting device | Mahbub Rashed, Jongwook Kye | 2016-03-22 |
| 9287131 | Methods of patterning line-type features using a multiple patterning process that enables the use of tighter contact enclosure spacing rules | Jongwook Kye, Harry J. Levinson | 2016-03-15 |
| 9268897 | Method for increasing the robustness of a double patterning router used to manufacture integrated circuit devices | Hidekazu Yoshida, Youngtag Woo, Jongwook Kye | 2016-02-23 |