Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9513548 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Yoshifumi Oizumi, Masafumi Hori +3 more | 2016-12-06 |
| 9329474 | Photoresist composition and resist pattern-forming method | Norihiko Ikeda | 2016-05-03 |