Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9416298 | Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (CMP) of III-V material in the presence of a CMP composition comprising a specific non-ionic surfactant | Yuzhuo Li, Bastian Marten Noller, Christophe Gillot | 2016-08-16 |
| 9263296 | Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors | Bastian Marten Noller, Michael Lauter, Albert Budiman Sugiharto, Yuzhuo Li, Kenneth Rushing +1 more | 2016-02-16 |